Scheda di dettaglio – i prodotti della ricerca
| Dato | Valore |
|---|---|
| Title | ENHANCED REMOVAL OF HALOGENATED ORGANICS FROM INDUSTRIAL GROUNDWATER BY SEQUENTIAL UV/H2O2 TREATMENT AND CARBON ADSORPTION |
| Abstract | The removal enhancement by a combination of UV/H2O2 degradation and GAC adsorption was investigated for the remediation of industrial groundwater heavily polluted by several halogenated organics. The UV/H2O2 process alone was able to remove all pollutants (90-97% in 30 min) but for the 1,2-dichloroethane, the most abundant one (initial concentration 25000 =ug/L), the residual concentration (760 ug/L) was much higher than that set by the current legislation (3 ug/L). The employment of UV/H2O2+GAC allowed to reach the target residual concentration. Interestingly, it was found that GAC adsorption capacity was greater than expected. This was ascribed to the decomposition of residual H2O2 on the GAC giving rise to the formation of hydroxyl radicals that removed the residual organics. Therefore, the second step of the process consisted of a combination of heterogeneous oxidation and adsorption. This is of relevance for lowering the operation cost of the groundwater remediation process |
| Source | 5TH IWA SPECIALIST CONF. /10TH IOA-EA3G CONF. OXIDATION TECHNOLOGIES FOR WATER AND WASTEWATER TREATMENT OXIDATION TECHNOLOGIES FOR WATER AND WASTEWATER TREATMENT , BERLINO, marzo 30-aprile 2 |
| Keywords | groundwaterchemical industry12-dichloroethane |
| Year | 2009 |
| Type | Contributo in atti di convegno |
| Authors | MASCOLO G; CIANNARELLA R; LOPEZ A;PAGANO M; |
| Text | 89676 2009 groundwater chemical industry 1 2 dichloroethane ENHANCED REMOVAL OF HALOGENATED ORGANICS FROM INDUSTRIAL GROUNDWATER BY SEQUENTIAL UV/H2O2 TREATMENT AND CARBON ADSORPTION MASCOLO G; CIANNARELLA R; LOPEZ A;PAGANO M; Mascolo Giuseppe; Istituto di Ricerca Sulle Acque, Consiglio Nazionale delle Ricerche, Via F. De Blasio, 5, 70123 Bari, Ciannarella Ruggiero; Istituto di Ricerca Sulle Acque, Consiglio Nazionale delle Ricerche, Via F. De Blasio, 5, 70123 Bari, Lopez Antonio; Istituto di Ricerca Sulle Acque, Consiglio Nazionale delle Ricerche, Via F. De Blasio, 5, 70123 Bari, Pagano Michele; Istituto di Ricerca Sulle Acque, Consiglio Nazionale delle Ricerche, Via F. De Blasio, 5, 70123 Bari, The removal enhancement by a combination of UV/H2O2 degradation and GAC adsorption was investigated for the remediation of industrial groundwater heavily polluted by several halogenated organics. The UV/H2O2 process alone was able to remove all pollutants 90 97% in 30 min but for the 1,2 dichloroethane, the most abundant one initial concentration 25000 =ug/L , the residual concentration 760 ug/L was much higher than that set by the current legislation 3 ug/L . The employment of UV/H2O2 GAC allowed to reach the target residual concentration. Interestingly, it was found that GAC adsorption capacity was greater than expected. This was ascribed to the decomposition of residual H2O2 on the GAC giving rise to the formation of hydroxyl radicals that removed the residual organics. Therefore, the second step of the process consisted of a combination of heterogeneous oxidation and adsorption. This is of relevance for lowering the operation cost of the groundwater remediation process Oxidation Technologies for water and wastewater treatment 978 3 89720 990 9 5TH IWA SPECIALIST CONF. /10TH IOA EA3G CONF. OXIDATION TECHNOLOGIES FOR WATER AND WASTEWATER TREATMENT OXIDATION TECHNOLOGIES FOR WATER AND WASTEWATER TREATMENT BERLINO marzo 30 aprile 2 Internazionale Contributo ENHANCED REMOVAL OF HALOGENATED ORGANICS FROM INDUSTRIAL GROUNDWATER BY SEQUENTIAL UV/H2O2 TREATMENT AND CARBON ADSORPTION Mascolo_P60.pdf Contributo in atti di convegno antonio.lopez LOPEZ ANTONIO michele.pagano PAGANO MICHELE ruggiero.ciannarella CIANNARELLA RUGGIERO giuseppe.mascolo MASCOLO GIUSEPPE TA.P07.002.002 Sviluppo di nuovi processi di controllo dell inquinamento idrico. |